Silicon Wafer Microstructure Fabrication Using Nanosecond Laser Pulses

De Fu Xu; Shao Quan Yin; Zhi Gang Xiao; Xiao Xiao

doi:10.4028/www.scientific.net/AMR.476-478.1798

Paper Titles

Research on the Influence of Electron Beam Parameters on Molten Pool Morphologies during Electron Beam Melting Silicon
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Applicability of Gd_0.9Ca_0.1AlO_3-δ Ceramic Electrolyte for Intermediate Temperature Solid Oxide Fuel Cells
p.1785

Kinematics and Dynamics Simulation of Key Components of Wind Turbine
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Preparation of Porous Silicon and Effect of Gettering on the Resistivity
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Silicon Wafer Microstructure Fabrication Using Nanosecond Laser Pulses
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Development of Solid Oxide Electrolyzer Cell (SOEC) Cathode Materials
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Characterization and Preparation of Well-Dispersed TiO₂ Nanoparticles by Ultrasonic Microemulsion Method
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High-Temperature CO₂ Capture Using MgO/γ-Al₂O₃ Materials as Adsorbent
p.1811

Preparation of Large Size Pyramidal Texture on N-Type Monocrystalline Silicon Using TMAH Solution for Heterojunction Solar Cells
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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 476-478Silicon Wafer Microstructure Fabrication Using...

Silicon Wafer Microstructure Fabrication Using Nanosecond Laser Pulses

Abstract:

In this paper, we created some microstructures on the surface of silicon by irradiating a silicon wafer for soalr cell with trains of short pulses in the presence of an ambient gas.The laser pulse produced by TEA CO2 laser is high power and shorter than a microsecond in duration. We found that the morphology of the structures is highly dependent on the species of ambient gas and the number of laser pulses used. I note that surfaces covered with these microstructures have striking optical properties: structures absorb approximately 90% of incident light with wavelengths between 250 nm and 0.85μm.The remarkable and potentially useful optical properties of the structures should be beneficial in increasing the efficiency of crystalline silicon soalr cell.

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Periodical:

Advanced Materials Research (Volumes 476-478)

Pages:

1798-1801

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.476-478.1798

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Online since:

February 2012

Authors:

De Fu Xu, Shao Quan Yin, Zhi Gang Xiao, Xiao Xiao

Keywords:

Absorbency, Infrared Laser Pulse, Microstructure, Silicon Wafer

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References

[1] A. Shirakawa and T. Kobayashi, Appl. Phys. Lett. 72, 147 (1998).

Google Scholar

[2] C. Wu, Femtosecond laser-gas-solid interactions, Ph.D. thesis, Harvard University (2000).

Google Scholar

[3] A. Cavalleri, K. Sokolowski-Tinten, J. Bialkowski, M. Schreiner, and D. von der Linde, J. Appl. Phys. 85, 3301 (1999).

DOI: 10.1063/1.369675

Google Scholar

[4] T. J. Chuang, in Laser-Controlled Chemical Processing of Surfaces, edited by A. W. Johnson, D. J. Ehrlich, and H. R. Schlossberg (North-Holland, New York,1980).

Google Scholar

[5] L. J. Stinson, J. A. Howard, and R. C. Neville, J. Electrochem. Soc. 123, 551(1976).

Google Scholar

[6] M. K¨ohler, Etching in Microsystem Technology (Wiley-VCH,Weinheim, 1999)

Google Scholar