Preparation and Character Measurements of ZrO2 Films for RF Magnetron Sputtering

Tai Long Gui; Ji Ying Wen; Jin Shuo Mei

doi:10.4028/www.scientific.net/AMR.490-495.3358

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 490-495Preparation and Character Measurements of ZrO2...

Preparation and Character Measurements of ZrO₂ Films for RF Magnetron Sputtering

Abstract:

ZrO2 thin films were deposited on glass substrates via RF magnetron sputtering technique and post-deposition annealing treatment.The films transmittance and surface structure were investigated by means of Ultraviolet spectrophotometer, AFM and XRD. The effect of annealing on the optical properties of the films has been studied as well.The research result indicates that the size of ZrO2 film grain obviously gets bigger, the surface is more smooth and transmission rate increases after 800°C, annealing 30min.