Effects of Annealing Temperature on Optical Properties of Bi3.4Nd0.6Ti3O12 Films by RF Magnetron Sputtering Method

Yan Zou; Qiu Xiang Liu; Yan Ping Jiang; Xin Gui Tang

doi:10.4028/www.scientific.net/AMR.503-504.620

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 503-504Effects of Annealing Temperature on Optical...

Effects of Annealing Temperature on Optical Properties of Bi_3.4Nd_0.6Ti₃O₁₂ Films by RF Magnetron Sputtering Method

Abstract:

Bi3.4Nd0.6Ti3O12 (BNT) thin films have been prepared on Si (100) substrate by RF magnetron sputtering method. The crystalline structures were studied by X-ray diffraction. The surface of the films have been observed by SEM. The reflectivity was measured by n & k Analyzer 2000 with the wavelength from 190 to 900 nm. The optical constant, thickness and the forbidden band gap were fitted. The results showed that with the annealing temperatures raised from 600 to 750 °C, the reflectivity index decreased from 2.224 to 2.039, and the forbidden band gap decreased from 3.19 to 2.99 eV. The possible mechanism of the effect of annealing temperature on the optical properties was discussed.

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Periodical:

Advanced Materials Research (Volumes 503-504)

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620-624

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.503-504.620

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Online since:

April 2012

Authors:

Yan Zou, Qiu Xiang Liu, Yan Ping Jiang, Xin Gui Tang

Keywords:

Annealing Temperature, Bismuth Titanate, Optical Property, Thin Film

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