Optimization of the Sputtering Process Parameters of AZO Films with Multiple Quality Characteristics

Dong Cherng Wen; Chun Yao Hsu; Ai Huei Chiou

doi:10.4028/www.scientific.net/AMR.512-515.1961

Paper Titles

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Optimization of the Sputtering Process Parameters of AZO Films with Multiple Quality Characteristics
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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 512-515Optimization of the Sputtering Process Parameters...

Optimization of the Sputtering Process Parameters of AZO Films with Multiple Quality Characteristics

Abstract:

Aluminum-doped zinc oxide (AZO) films were deposited on polyethylene terephthalate (PET) by radio frequency magnetron sputtering. The influence of the various deposition parameters (R.F. power, substrate-to-target distance, substrate temperature, deposition time) on electrical, morphological and optical properties of AZO/PET films was investigated. The use of grey-based Taguchi method to determine the optimization of the process parameters by considering multiple performance characteristics has been reported. The electrical resistivity and the average transmittance of the AZO films were improved by increasing the substrate temperature. Finds based on the grey relational analysis show that the lowest electrical resistivity of AZO films to be about 1.6 × 10^-3Ω-cm, and visible range transmittance about 80%.