The Diamond Crystal Nucleation by Combustion Activation CVD

Y. Wongprasert; R. Muanghlua; K. Sato

doi:10.4028/www.scientific.net/AMR.55-57.557

Paper Titles

Synthesis of Coil-Like Shape CNTs by Thermal CVD Method
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Attachment of Metal Oxide Nanoparticles on Carbon Nanotubes with Different Oxidation Levels
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Microstructure and Characterizations of Portland-Carbon Nanotubes Pastes
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Mechanical Properties of Hemp Fiber Composites with Carbon Nanotubes Reinforcement
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The Diamond Crystal Nucleation by Combustion Activation CVD
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Growth Conditions for Carbon Nanotubes and Helical Nanofibers on Copper Substrates Using Sparked Catalysts
p.561

Electronic Structure of Straight and T-Shape Singled-Wall Carbon Nanotube Junctions: A Molecular Quantum Mechanics Study
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Structural Evolution in the Processing of Fe/ BaFe₁₂O₁₉ Nano Composite via Mechanical Alloying
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Oxygen Control on Nanocrystal-AlON Films by Reactive Gas-Timing Technique R.F. Magnetron Sputtering and Annealing Effect
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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 55-57The Diamond Crystal Nucleation by Combustion...

The Diamond Crystal Nucleation by Combustion Activation CVD

Abstract:

This paper presents the diamond nucleation using combustion activation chemical vapor deposition (CACVD) by 0.95 volumetric ratio of O2 /C2H2 under atmospheric pressure. The main point of our work is to develop the CACVD technique for synthesize the semiconductor materials, which is developed for electronic devices application. The surface nucleation of substrate was studied by using surface pretreatment. The results of surface nucleation on mirror-silicon, polished silicon by diamond powder, silicon-dioxide (SiO2), and polished SiO2 by diamond powder, are significantly different. It can be concluded that the silicon-dioxide mask technique is useful for nucleated diamond protection whereas the polished silicon by diamond powder is suitable for nucleated diamond generation. These techniques are applied for the pattern fabrication.