Microstructure and Interfaces of Thin Film Capacitors on Base Metal Foils

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The microstructure and interface quality of chemical solution deposited barium titanate thin films on Ni foil were studied. Cross-sectional transmission electron microscopy shows that a ~200 nm thick barium titanate film annealed in a controlled oxygen partial pressure consists of equiaxed grains with grain size range of 24-75 nm (~ 42 nm average). NiO was detected after re-oxidation by X-ray diffraction, but not by transmission electron microscopy, suggesting that the oxide is not a continuous barrier layer, but is spatially distributed in the films. Oxygen non-stoichiometry and the existence of C in barium titanate films were observed by electron energy loss spectrometry. In addition, it was found that there is a 5-8 nm thick Ni-Ba alloy developed at the interface between the barium titanate film and Ni foil.

Info:

Periodical:

Advanced Materials Research (Volumes 55-57)

Main Theme:

Edited by:

Tawee Tunkasiri

Pages:

917-920

DOI:

10.4028/www.scientific.net/AMR.55-57.917

Citation:

T. Dechakupt et al., "Microstructure and Interfaces of Thin Film Capacitors on Base Metal Foils ", Advanced Materials Research, Vols. 55-57, pp. 917-920, 2008

Online since:

August 2008

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$35.00

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