Research on (Ti,Al)N Films Deposited by FCVA

You Long Zhou; Zhou Chen; Sheng Xing Ji; Huang Nan; Nan Huang

doi:10.4028/www.scientific.net/AMR.557-559.1893

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 557-559Research on (Ti,Al)N Films Deposited by FCVA

Research on (Ti,Al)N Films Deposited by FCVA

Abstract:

Abstract：(Ti, Al)N films were deposited on high-speed steel (HSS) by filtered cathodic vacuum arc (FCVA) technique under a nitrogen atmosphere. X-ray diffraction was used to characterize the structure of the films .The micro-hardness was tested. The result shows that the crystal structure and mechanical properties of (Ti,Al)N films are strongly dependent on the nitrogen partial pressure. The structure of (Ti,Al)N films is composed of Ti2N phase, TiN phase and TixAly phase. The hardness increases to a maximum at the nitrogen partial pressure of 8•0×10-2Pa, then decreases with increasing nitrogen partial pressure.

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Periodical:

Advanced Materials Research (Volumes 557-559)

Pages:

1893-1896

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.557-559.1893

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Online since:

July 2012

Authors:

You Long Zhou, Zhou Chen, Sheng Xing Ji, Huang Nan, Nan Huang

Keywords:

FCVA, Friction Coefficient (FC), Hardness, X-Ray Diffraction (XRD)

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