Surface Nanocrystallization of Nickel Produced by High-Current Pulsed Electron Beam Irradiation

Zhi Yong Han; Hui Zou; Zhi Ping Wang; Jin Tong Guan; Qing Feng Guan

doi:10.4028/www.scientific.net/AMR.560-561.709

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 560-561Surface Nanocrystallization of Nickel Produced by...

Surface Nanocrystallization of Nickel Produced by High-Current Pulsed Electron Beam Irradiation

Abstract:

The nanocrystalline surface was obtained on bulk pure nickel by using high-current pulsed electron beam (HCPEB) technique. The temperature field induced by HCPEB was numerically simulated. The structures of the nanocrystallized surface were characterized by scanning electron beam (SEM), which showed that after HCPEB irradiation, the initial coarse-grained structure on the surface was refined into fine grains with sizes of about 70nm. It was revealed that melting surface caused by HCPEB irradiation and subsequently rapid cooling was the dominant mechanism of the surface nanocrystallization of bulk nickel. The HCPEB technique provides a new method for rapid fabricating surface-nanocrystallized materials.

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Periodical:

Advanced Materials Research (Volumes 560-561)

Pages:

709-713

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.560-561.709

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Online since:

August 2012

Authors:

Zhi Yong Han, Hui Zou, Zhi Ping Wang, Jin Tong Guan, Qing Feng Guan

Keywords:

Bulk Pure Nickel, High Current Pulsed Electron Beam (HCPEB), Numerical Simulation, Rapid Solidification, Surface Nanocrystallization

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