Study on Correlate Qualitatively the Deposition Conditions with the Morphology of the Nanocomposite Films

Yong Jun Jiang

doi:10.4028/www.scientific.net/AMR.562-564.290

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 562-564Study on Correlate Qualitatively the Deposition...

Study on Correlate Qualitatively the Deposition Conditions with the Morphology of the Nanocomposite Films

Abstract:

In the Nb–Si–N films, Si content (CSi) was varied in each series by changing the power applied on the Si target, whereas the power on the Nb target was kept constant. The microstructure of the coatings was examined by XRD and in cross-section by transmission electron microscopy (TEM). Depending on TS and pN2, the deposition rate showed significant variations from 0.04 to 0.18 nm/s. The correlation between film morphology (preferential orientation of crystallites, grain size, column dimensions, thickness of the SiNx layer covering NbN crystallites) and the deposition conditions (power applied on Si target, temperature, nitrogen partial pressure and deposition rate) provides useful information for optimizing the deposition process.

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Periodical:

Advanced Materials Research (Volumes 562-564)

Pages:

290-293

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.562-564.290

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Online since:

August 2012

Authors:

Yong Jun Jiang

Keywords:

Crystallite, Deposition, Morpholoy, Nanocomposite

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