Study on Correlate Qualitatively the Deposition Conditions with the Morphology of the Nanocomposite Films
In the Nb–Si–N films, Si content (CSi) was varied in each series by changing the power applied on the Si target, whereas the power on the Nb target was kept constant. The microstructure of the coatings was examined by XRD and in cross-section by transmission electron microscopy (TEM). Depending on TS and pN2, the deposition rate showed significant variations from 0.04 to 0.18 nm/s. The correlation between film morphology (preferential orientation of crystallites, grain size, column dimensions, thickness of the SiNx layer covering NbN crystallites) and the deposition conditions (power applied on Si target, temperature, nitrogen partial pressure and deposition rate) provides useful information for optimizing the deposition process.
Y. J. Jiang, "Study on Correlate Qualitatively the Deposition Conditions with the Morphology of the Nanocomposite Films", Advanced Materials Research, Vols. 562-564, pp. 290-293, 2012