Parameter Optimerization for Photo Polymerization of Microstereolithography

K. Khairu; Ibrahim Raman; Mohammad Asraf Shaik Mohamed; Mustaffa Ibrahim; Wahab Saidin

doi:10.4028/www.scientific.net/AMR.626.420

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 626Parameter Optimerization for Photo Polymerization...

Parameter Optimerization for Photo Polymerization of Microstereolithography

Abstract:

This paper presents a research on composition photo absorber (Sudan I) effect based on curing parameter, the Liquid Crystal Display (LCD) projector as energy light source initiated the photo reactive polymer. The polymer based material with composition of 1, 6-Hexanediol dicrylate, Phenylbis (2,4,6-trimethylbenzoyl) phosphine oxide with varied Sudan I concentration was used to build 3D structures. The structure was fabricated with three different photo absorber concentrations 0.002%, 0.003%. and 0.006%. of Sudan I. In this experiment the photoreactive polymer solidification phenomena was evaluated.The experiment result obtained, that exposed time of the varied photo absorber was most significantly affect the surface roughness values and the solidification layer time regardless the layer thickness. This work represents that photo absorber composition solution gave a different characteristics for 3D microstructure fabrication.

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Periodical:

Advanced Materials Research (Volume 626)

Pages:

420-424

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.626.420

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Online since:

December 2012

Authors:

K. Khairu, Ibrahim Raman, Mohammad Asraf Shaik Mohamed, Mustaffa Ibrahim, Wahab Saidin

Keywords:

3D Microstructure, Exposed Time, Layer Thickness, Microstereolithography Photoreactive Polymer, Photoabsorber, Rapid Prototyping (RP)

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References

[1] D Chua, C.K., Leong, K.F. and Lim, C.S. ). ed. Rapid Prototyping: Principles and Applications. World Scientific Publishing Singapore, (2003).

Google Scholar

[2] Gebhardt, A., ed. Rapid Prototyping. Hanser Gardner Publications: Cincinnati, OH. (2003).

Google Scholar

[3] Ikuta K, H.K., Real three-dimensional microfabrication using stereolithography and metal mold. Proc IEEE, (International Workshop on Micro Electro Mechanical Systems(MEMS'93) (1993)pp.42-47.

Google Scholar

[4] Bertsch, A., Zissi, S., Jezequel, J.Y., Corbel,S. andAndre, J.C., Microstereophotolithography using a liquidcrystal display as dynamic mask-generator. Microsystem Technologies,. Vol. 3 (No. 2): (1997)pp.42-47.

DOI: 10.1007/s005420050053

Google Scholar

[5] Bertsch A, L.H., Renaud P, 3D microfabrication bycombining microstereolithography and Thick resist Uv lithography. Sens Actuators, (1999): pp.14-23.

DOI: 10.1016/s0924-4247(98)00249-0

Google Scholar

[6] Bertsch A, B.P., Vogt C, Renaud P, Rapid prototyping of small size objects. Rapid Prototyping. 6(4): (2000)pp.259-266.

DOI: 10.1108/13552540010373362

Google Scholar

[7] Bertsch A, J.J., Andre JC Study of spatial resolution of a new 3D microfabrication process: the microstereolithography using a dynamic mask-generator technique. Jphotochem Photobiol A, 1997(107): pp.275-281.

DOI: 10.1016/s1010-6030(96)04585-6

Google Scholar

[8] Zissi, S., Bertsch, A., Jezequel, J.Y., Corbel, S., Lougnot, D.J. and Andre, J.C., Stereolithography and microtechniques, Microsystem Technologies, Vol. 2 No. 2, (1996)pp.97-102.

DOI: 10.1007/bf02447758

Google Scholar