The Model of Transfer Robot in Chemical Mechanical Polishing

Abstract:

Transfer robot of chemical mechanical polishing (TR_CMP) has some joints. For an important kind of special transfer robot, it is used as automatic material processing equipment in the semiconductor manufacture. The TR_CMP has nonlinear, strongly coupled, multi-joints and under actuated, and these characteristics brought some difficulties to model and control. A dynamic model of the TR_CMP was based on Lagrange equation and Newton dynamics theory. Then linearization of the dynamics model was done and its state-space equations were established. This structure of the model established is very simple, and it can control the TR_CMP effectively and easy. Simulation results proved the system stability, and experiment results analyzed verified that the model of TRCMP is valid and rational.

• Periodical: Advanced Materials Research (Volume 647)
• Pages: 867-874
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.647.867
• Online since: January 2013
• Authors: Jian Wei Zhao, Xin Chun Lu, Yong Yong He
• Keywords: Chemical Mechanical Polishing, Dynamic Model, Lagrange Dynamic Equation, Transfer Robot

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