Effect of Hydrogen Dilution on Properties of Microcrystalline Silicon Thin Films Prepared by VHF-PECVD

Abstract:

Microcrystalline silicon thin films were deposited on glass substrates by VHF-PECVD varying the ratio of hydrogen dilution from 88% to 98%. The structural characteristics, deposition rate and photosensitivity of the films were investigated. With the improvement of the hydrogen dilution ratio, crystallization rate of the films had been improved which was much more stable than amorphous silicon that the films transmit from amorphous silicon to microcrystalline silicon. However the deposition rate had been reduced with the increase of the hydrogen dilution and the highest deposition rate was 0.43nm/s. The samples showed a downward trend of photosensitivity with optical and dark conductivity both decreasing first then increasing. Thus suitable hydrogen dilution ratio should be chosen according to the different needs in preparation of microcrystalline silicon film.

• Periodical: Advanced Materials Research (Volumes 652-654)
• Pages: 1739-1742
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.652-654.1739
• Online since: January 2013
• Authors: Xia Wu, Long Gu, Ji Sen Zhang, Hui Dong Yang
• Keywords: Hydrogen Dilution, Microcrystalline Silicon Thin Films, VHF-PECVD

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