Properties of Al Films Depend on Substrate Temperature by DC Magnetron Sputter Deposition

Yi Shen; Ruo He Yao

doi:10.4028/www.scientific.net/AMR.662.413

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 662Properties of Al Films Depend on Substrate...

Properties of Al Films Depend on Substrate Temperature by DC Magnetron Sputter Deposition

Abstract:

Al films were prepared by DC magnetron sputter deposition at different substrate temperatures. The sheet resistance of the films was measured by four point probe sheet resistance meter, and the film thickness, which was obtained by surface profiling system. The surface and cross-section morphology of the films was observed by AFM and FESEM. As a result, the resistivity of the films decreases obviously as the substrate temperature increases gradually. The higher substrate temperature is, the rougher the films surface is and the larger the grain size is.

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Periodical:

Advanced Materials Research (Volume 662)

Pages:

413-416

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.662.413

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Online since:

February 2013

Authors:

Yi Shen, Ruo He Yao

Keywords:

DC Magnetron Sputter Deposition, Grain Growth, Resistivity, Substrate Temperature

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