Simulation of Large-Area Inductively Coupled Plasma Source

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812-818

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February 2013

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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[1] Lieberman, M. A. & Lichtenberg, A. J. Principles of plasma discharges and materials processing. (1994).

Google Scholar

[2] Kanoh, M., Suzuki, K., Tonotani, J., Aoki, K. & Yamage, M. Inductively coupled plasma source with internal straight antenna. Japanese Journal of Applied Physics 40, 5419 (2001).

DOI: 10.1143/jjap.40.5419

Google Scholar

[3] Hopwood, J. Review of inductively coupled plasmas for plasma processing. Plasma Sources Science and Technology 1, 109 (1992).

DOI: 10.1088/0963-0252/1/2/006

Google Scholar

[4] Li, Y., Iizuka, S. & Sato, N. Production of a large-diameter uniform plasma by modified magnetron-typed radio frequency discharge. Japanese Journal of Applied Physics 36, 4554-4557 (1997).

DOI: 10.1143/jjap.36.4554

Google Scholar

[5] Chen, F. F., Evans, J. D. & Tynan, G. R. Design and performance of distributed helicon sources. Plasma Sources Science and Technology 10, 236 (2001).

DOI: 10.1088/0963-0252/10/2/313

Google Scholar

[6] Kim, K., Jung, S. & Yeom, G. Plasma and impedance characteristics of internal linear antennas for flat panel display applications. Thin solid films 491, 82-85 (2005).

DOI: 10.1016/j.tsf.2005.05.030

Google Scholar

[7] Lim, J. H., Kim, K. N., Park, J. K., Lim, J. T. & Yeom, G. Y. Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing. Applied physics letters 92, 051504-051504-051503 (2008).

DOI: 10.1063/1.2840997

Google Scholar