Systematic Design of a Highly Efficient Uniform Grating Coupler with Gradually Etched Depths for SOI Waveguides

Jian Wei Huang; Huai Yi Chen

doi:10.4028/www.scientific.net/AMR.663.713

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 663Systematic Design of a Highly Efficient Uniform...

Systematic Design of a Highly Efficient Uniform Grating Coupler with Gradually Etched Depths for SOI Waveguides

Abstract:

This study systematically designs a grating coupler with gradually etched depth on the silicon-on-insulator (SOI) substrate. We focus on the modulation design of the grating coupler with gradually etched depth. The proposed grating coupler is suitable for single TE-mode fiber coupling at the wavelength of 1.55μm. Its fiber coupling efficiency can be up to 57%, fiber coupling angle is 8o and the 1dB bandwidth is 73 nm. These results are better than those of conventional uniform grating coupler without gradually etched depth in terms of efficiency. The grating coupler proposed here is easier to design as compared with the non-uniform grating couplers using lag effect.

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Periodical:

Advanced Materials Research (Volume 663)

Pages:

713-716

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.663.713

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Online since:

February 2013

Authors:

Jian Wei Huang, Huai Yi Chen

Keywords:

Fiber Coupling Efficiency, Gradually Etched Region, Grating Coupler, Silicon-on-Insulator (SOI) Substrate

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