[1]
Minami T. Substitution of transparent conducting oxide thin films for indium tin oxide transparent electrode applications. Thin Solid Films 2008; 516: 1314-21.
DOI: 10.1016/j.tsf.2007.03.082
Google Scholar
[2]
Fang G, Li D Yao BL. Fabrication and vacuum annealing of transparent conductive AZO thin films prepared by DC magnetron sputtering. Vacuum 2003; 68: 363-72.
DOI: 10.1016/s0042-207x(02)00544-4
Google Scholar
[3]
J. -K. Sheu, Y.S. Lu, M. -L. Lee, W.C. Lai, C.H. Kuo, C. -J. Tun, Appl. Phys. Lett. 90(2007) 263511.
Google Scholar
[4]
V. Bhosle, J.T. Prater, F. Yang, D. Burk, S.R. Forrest, J. Narayan, J. Appl. Phys. 102(2007) 023501.
Google Scholar
[5]
L. Wang, M. -H. Yoon, A. Facchetti, T.J. Marks, Adv. Mater. 19(2007)3252.
Google Scholar
[6]
S. Fay,U. Kroll,C. Bucher, et al. Low pressure chemical vapour deposition of ZnO layers for thin-film solar cells: Temperature-induced morphological changes, Solar Energy Materials Solar Cells 86 (2005) 385-397.
DOI: 10.1016/j.solmat.2004.08.002
Google Scholar
[7]
X.L. Chen, X.H. Geng, J.M. Xue, et al. Temperature-dependent growth of zinc oxide thin films grown by metal organic chemical vapor deposition, Journal of Crystal Growth 296 (2006) 43-50; 2.
DOI: 10.1016/j.jcrysgro.2006.08.028
Google Scholar
[8]
W.B. Pearson, Crystal Chemistry and Physics of Metals and Alloys, Wiley, New Youk, 1972, p.76.
Google Scholar
[9]
H. Kato, M. Sano, K. Miyamoto, T. Yao, J. Crystal Growth 538(2002) 237.
Google Scholar
[10]
X. Bie, J.G. Lu, L. Gong, L. Lin, B.H. Zhao, Z.Z. Ye, Applied Surfacce Science 256 (2009) 289.
Google Scholar
[11]
W.T. Yen, Y.C. Lin P.C. Yao J.H. Ke, Y.L. Chen, Applied Surface Science 256(2010) 3432.
Google Scholar
[12]
Zhang XB, Pei ZL, Gong J, Sun C. Investigation on the electrical properties and inhomogeneous distribution of ZnO: Al thin films prepared by DC magnetron sputtering at low deposition temperature. J Appl phys 2007; 101: 014910.
DOI: 10.1063/1.2407265
Google Scholar
[13]
Yang W, Liu Z, Peng DL, Zhang F, Huang H, Xie Y, et al. Room-temperature deposition of transparent conducting Al-doped ZnO. Appl Surf Sci 2009; 255: 5669-73.
DOI: 10.1016/j.apsusc.2008.12.021
Google Scholar
[14]
Cebulla R, Wendt R, Ellmer K. Al-doped zinc oxide films deposited by stimultaneous RF and DC excitation of a magnetron plasma: relationships between plasma parameters and structural and electrical film properties. J Appl Phys 1998; 83: 95-1087.
DOI: 10.1063/1.366798
Google Scholar
[15]
W.D. Jones: Principles of Powder Metallurgy, Edward Arnold, (1960).
Google Scholar
[16]
Guan Zhenduo, Zhang Zhongtai, Jiao Jinsheng, physical properties of inorganic material, Beijing: pressed by qinghua university, 2004, page82.
Google Scholar