Sensitivity Studies on Vacuum Deposited V2O5 Thin Films

A. Dhayal Raj; P. Suresh Kumar; N. Sabari Arul; D. Mangalaraj; A. Albert  Irudayaraj

doi:10.4028/www.scientific.net/AMR.678.42

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 678Sensitivity Studies on Vacuum Deposited V2O5 Thin...

Sensitivity Studies on Vacuum Deposited V₂O₅ Thin Films

Abstract:

Vanadium pentoxide thinfilms have been deposited by vacuum evaporation method and the effect of deposition temperatures on the surface morphology of the prepared sample has been analyzed. Structural and morphological were carried out on the prepared samples, using X-Ray Diffractometer (XRD) and Scanning Electron Microscopy (SEM). The samples deposited at elevated temperature showed nanopetal like structures on their surface which were found to be around 100-200 nm. The formation of the V2O5 phase has been confirmed through TG/DTA analysis which shows a sharp peak around 690°C corresponding to the melting point of vanadium pentoxide. The best sample was subjected to gas sensing analysis and the change in the resistance of the sensing element with respect to the test gas concentration was measured by noting down the resistance at each concentration for various time intervals. Sensitivity of the material linearly increased with different concentration of the test gas.

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Periodical:

Advanced Materials Research (Volume 678)

Pages:

42-45

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.678.42

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Online since:

March 2013

Authors:

A. Dhayal Raj, P. Suresh Kumar, N. Sabari Arul, D. Mangalaraj, A. Albert Irudayaraj

Keywords:

Nanoflakes, Sensitivity, Thermal Evaporation, V₂O₅

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