Microstructural Characterization of Electro-Deposited CdSe Thin Films

S. Thanikaikarasan; T. Mahalingam; S.R. Srikumar; Tae Kyu Kim; Yong Deak Kim; Velumani Subramaniam; Rene Asomoza

doi:10.4028/www.scientific.net/AMR.68.44

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 68Microstructural Characterization of...

Microstructural Characterization of Electro-Deposited CdSe Thin Films

Abstract:

Thin films of CdSe were electrodeposited on tin oxide coated conducting glass substrates at various bath temperatures. The deposited films were characterized by x-ray diffraction (XRD) and scanning electron microscopy (SEM). X-ray diffraction studies revealed that the deposited films are found to be hexagonal structure with preferential orientation along (002) plane. The microstructural parameters such as crystallite size, R.M.S strain, dislocation density, stacking fault probability were calculated using x-ray line profile analysis technique. The variation of microstructural parameters with bath temperature and film thickness were studied and discussed.