Transparent Ultraviolet Sensors Based on Magnetron Sputtered ZnO Thin Films

Article Preview

Abstract:

Ultraviolet (UV) sensors have variety of applications. In this work, a new transparent UV sensor is developed based on zinc oxide (ZnO) films. The ZnO films with 350 nm thicknesses were fabricated on glass substrates by using direct current (DC) plasma magnetron sputtering technique. The ZnO UV sensors are characterised by using current-voltage (I-V) measurements at room temperature. The current is measured by applying small bias voltage under the white light, UV light (325 nm), and dark condition and the photocurrent responses extracted from the I-V measurements are compared. The transparent UV sensors based on ZnO films deposited at high substrate temperature of 450 °C exhibit most significant photocurrent response under UV irradiation.

You might also be interested in these eBooks

Info:

Periodical:

Pages:

79-85

Citation:

Online since:

April 2013

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2013 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] H. Morkoç and Ü. Özgür, Zinc Oxide: Fundamentals, Materials and Device Technology: Wiley-VCH, (2009).

Google Scholar

[2] U. Özgür, D. Hofstetter, and H. Morkoç, ZnO Devices and Applications: A Review of Current Status and Future Prospects, Proceedings of the IEEE, vol. 98, pp.1255-1268, (2010).

DOI: 10.1109/jproc.2010.2044550

Google Scholar

[3] H. Hosono, Recent progress in transparent oxide semiconductors: Materials and device application, Thin Solid Films, vol. 515, pp.6000-6014, (2007).

DOI: 10.1016/j.tsf.2006.12.125

Google Scholar

[4] A. Janotti and C. G. Van de Walle, Fundamentals of zinc oxide as a semiconductor, Reports on Progress in Physics, vol. 72, p.126501, (2009).

DOI: 10.1088/0034-4885/72/12/126501

Google Scholar

[5] C. F. Klingshirn, B. K. Meyer, A. Waag, A. Hoffmann, and J. M. M. Geurts, Zinc Oxide: From Fundamental Properties Towards Novel Applications vol. 120: Springer Verlag, (2010).

DOI: 10.1007/978-3-642-10577-7

Google Scholar

[6] J. W. Hoon, K. Y. Chan, J. Krishnasamy, and T. Y. Tou, Zinc Oxide Thin Films Fabricated with Direct Current Magnetron Sputtering Deposition Technique, in Malaysia Annual Physics Conference 2010 (PERFIK 2010), Damai Laut (Malaysia) 2011, pp.235-237.

DOI: 10.1063/1.3573740

Google Scholar

[7] G. P. Daniel, V. B. Justinvictor, P. B. Nair, K. Joy, P. Koshy, and P. V. Thomas, Effect of annealing temperature on the structural and optical properties of ZnO thin films prepared by RF magnetron sputtering, Physica B: Condensed Matter, vol. 405, pp.1782-1786, (2010).

DOI: 10.1016/j.physb.2010.01.039

Google Scholar

[8] S. A. Kamaruddin, K. Y. Chan, H. K. Yow, M. Z. Sahdan, H. Saim, and D. Knipp, Zinc oxide films prepared by sol-gel spin coating technique, Applied Physics a-Materials Science & Processing, vol. 104, pp.263-268, Jul (2011).

DOI: 10.1007/s00339-010-6121-2

Google Scholar

[9] S. A. Kamaruddin, M. Z. Sahdan, K. Y. Chan, M. Rusop, and H. Saim, Zinc oxide microrods prepared by sol-gel immerse technique, Microelectronics International, vol. 27, pp.166-169, (2010).

DOI: 10.1108/13565361011061984

Google Scholar

[10] R. Ayouchi, F. Martin, D. Leinen, and J. Ramos-Barrado, Growth of pure ZnO thin films prepared by chemical spray pyrolysis on silicon, Journal of Crystal Growth, vol. 247, pp.497-504, (2003).

DOI: 10.1016/s0022-0248(02)01917-6

Google Scholar

[11] J. Franklin, B. Zou, P. Petrov, D. McComb, M. Ryan, and M. McLachlan, Optimised pulsed laser deposition of ZnO thin films on transparent conducting substrates, Journal of Materials Chemistry, vol. 21, pp.8178-8182, (2011).

DOI: 10.1039/c1jm10658a

Google Scholar

[12] Y. Xu, P. H. Ma, Y. B. Dou, and Y. Q. Cai, Effect of the Substrate Temperature on Crystalline and Optical Properties of ZnO Thin Films Prepared by CVD, Advanced Materials Research, vol. 239, pp.881-885, (2011).

DOI: 10.4028/www.scientific.net/amr.239-242.881

Google Scholar

[13] K. -H. Lee, N. -I. Cho, E. -J. Yun, and H. G. Nam, Characterization of ZnO thin films grown on various substrates by RF magnetron sputtering, Applied Surface Science, vol. 256, pp.4241-4245, (2010).

DOI: 10.1016/j.apsusc.2010.02.009

Google Scholar

[14] J. Krishnasamy, C. Kah-Yoong, H. Jian-Wei, S. A. B. Kamaruddin, and T. Teck-Yong, Direct current magnetron sputter-deposited ZnO thin films, in Photonics (ICP), 2010 International Conference, 2010, pp.1-3.

DOI: 10.1109/icp.2010.5604395

Google Scholar

[15] J. -W. Hoon, K. -Y. Chan, J. Krishnasamy, T. -Y. Tou, and D. Knipp, Direct current magnetron sputter-deposited ZnO thin films, Applied Surface Science, vol. 257, pp.2508-2515, (2011).

DOI: 10.1016/j.apsusc.2010.10.012

Google Scholar

[16] X. G. Zheng, Q. S. Li, J. P. Zhao, D. Chen, B. Zhao, Y. J. Yang, and L. C. Zhang, Photoconductive ultraviolet detectors based on ZnO films, Applied Surface Science, vol. 253, pp.2264-2267, (2006).

DOI: 10.1016/j.apsusc.2006.04.031

Google Scholar

[17] Y. Wu, T. Tamaki, W. Voit, L. M. Belova, and K. Rao, Ultraviolet Photoresponse of Pure and Al doped ZnO Polycrystalline Thin Films by Inkjet Printing, in MRS Proceedings, 2009, p.6.

DOI: 10.1557/proc-1161-i03-22

Google Scholar

[18] M. Razeghi and A. Rogalski, Semiconductor ultraviolet detectors, Journal of Applied Physics, vol. 79, pp.7433-7473, (1996).

DOI: 10.1063/1.362677

Google Scholar

[19] E. Monroy, F. Omnes, and F. Calle, Wide-bandgap semiconductor ultraviolet photodetectors, Semiconductor Science and Technology, vol. 18, p. R33, (2003).

DOI: 10.1088/0268-1242/18/4/201

Google Scholar

[20] K. Liu, M. Sakurai, and M. Aono, ZnO-Based Ultraviolet Photodetectors, Sensors, vol. 10, pp.8604-8634, (2010).

DOI: 10.3390/s100908604

Google Scholar

[21] S. E. Jarby. (2012), LLS EVO II Industry leading specifications. Available: http: /www. oerlikon. com/systems/en/products/semiconductors/wafer-lls-evo-ii.

Google Scholar

[22] S. Mraz and J. M. Schneider, Structure evolution of magnetron sputtered TiO2 thin films, Journal of Applied Physics, vol. 109, pp.023512-6, (2011).

DOI: 10.1063/1.3536635

Google Scholar

[23] S. Sudjatmoko, W. Wirjoadi, and B. S. Siswanto, Influence of substrate temperature on structural, electrical and optical properties of ZnO: Al thin films, Atom Indonesia Journal, vol. 35, (2011).

DOI: 10.17146/aij.2009.50

Google Scholar

[24] S. Hullavarad and N. Hullavarad (2011).

Google Scholar

[25] S. J. Young, L. W. Ji, S. J. Chang, and Y. K. Su, ZnO metal–semiconductor–metal ultraviolet sensors with various contact electrodes, Journal of Crystal Growth, vol. 293, (2006).

DOI: 10.1016/j.jcrysgro.2006.03.059

Google Scholar

[26] T. C. Zhang, Y. Guo, Z. X. Mei, C. Z. Gu, and X. L. Du, Visible-blind ultraviolet photodetector based on double heterojunction of n-ZnO/insulator-MgO/p-Si, Applied Physics Letters, vol. 94, p.113508, (2009).

DOI: 10.1063/1.3103272

Google Scholar

[27] K. Wang, Y. Vygranenko, and A. Nathan, Optically transparent ZnO-based n–i–p ultraviolet photodetectors, Thin Solid Films, vol. 515, pp.6981-6985, (2007).

DOI: 10.1016/j.tsf.2007.02.009

Google Scholar

[28] T. L. Tansley and D. F. Neely, Adsorption, desorption and conductivity of sputtered zinc oxide thin films, Thin Solid Films, vol. 121, pp.95-107, (1984).

DOI: 10.1016/0040-6090(84)90231-1

Google Scholar

[29] C. Liu, B. Zhang, Z. Lu, N. Binh, K. Wakatsuki, Y. Segawa, and R. Mu, Fabrication and characterization of ZnO film based UV photodetector, Journal of Materials Science: Materials in Electronics, vol. 20, pp.197-201, (2009).

DOI: 10.1007/s10854-008-9698-x

Google Scholar

[30] N. Jandow, F. Yam, S. Thahab, H. Abu Hassan, and K. Ibrahim, Characteristics of ZnO MSM UV photodetector with Ni contact electrodes on poly propylene carbonate (PPC) plastic substrate, Current Applied Physics, vol. 10, pp.1452-1455, (2010).

DOI: 10.1016/j.cap.2010.05.012

Google Scholar

[31] S. J. Young, L. W. Ji, S. J. Chang, and Y. K. Su, ZnO metal–semiconductor–metal ultraviolet sensors with various contact electrodes, Journal of Crystal Growth, vol. 293, pp.43-47, (2006).

DOI: 10.1016/j.jcrysgro.2006.03.059

Google Scholar

[32] J. M. Liu, Y. B. Xia, L. J. Wang, Q. F. Su, and W. M. Shi, Effect of grain size on the electrical properties of ultraviolet photodetector with ZnO/diamond film structure, Journal of Crystal Growth, vol. 300, pp.353-357, (2007).

DOI: 10.1016/j.jcrysgro.2006.12.029

Google Scholar

[33] X. Li, Q. Li, D. Liang, and Y. Xu, Electrical properties of silver Schottky contacts to ZnO thin films, Optoelectronics Letters, vol. 5, pp.216-219, (2009).

DOI: 10.1007/s11801-009-8216-6

Google Scholar