The Run-Time Configuration of Operating Parameters for Improved Performances of a Laser Annealing System

Dai Li; Li Ren Yan; Wei Zhou; Wei Zhang; Quan Wang

doi:10.4028/www.scientific.net/AMR.694-697.1439

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 694-697The Run-Time Configuration of Operating Parameters...

The Run-Time Configuration of Operating Parameters for Improved Performances of a Laser Annealing System

Abstract:

A laser annealing system for the CMOS IC processing is setup, consisting of a solid-state laser, a beam delivery system, a 2D movable wafer stage, an auxiliary heating system, and a chamber that holds all the above modules. The complexity of the system makes it much difficult to achieve a stable performance. Each related process factor is deliberated, and the strategies controlling of theses process parameters are then determined. A reconciling control method to balance the effect of laser energy density and laser beam shape is considered to maximize total production and reliability. A piece of Matlab code is programmed to assess the controlling effect. We found from running the system that after combining these strategies, system stability is improved, and desirable laser annealing process effects can be promised.

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Periodical:

Advanced Materials Research (Volumes 694-697)

Pages:

1439-1445

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.694-697.1439

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Online since:

May 2013

Authors:

Dai Li, Li Ren Yan, Wei Zhou, Wei Zhang, Quan Wang

Keywords:

IC Manufacturing, Impurity Activation, Laser Annealing, Process Control

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