ANN-Model for Plasma Chemical Vapor Deposition Process

Zhen Yu Li; Hong Sheng Li

doi:10.4028/www.scientific.net/AMR.699.92

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 699ANN-Model for Plasma Chemical Vapor Deposition...

ANN-Model for Plasma Chemical Vapor Deposition Process

Abstract:

Plasma Chemical Vapor Deposition process is one of the main process to make optical fiber core-rod. In this process, gas flow, pressure, furnace temperature, reflective microwave power , resonator moving speed and deposition rate are dependant aspects. An artificial neural network model is set up to describe the relationship of variables in the process, and also verified by the experiment and production. Based on the ANN-model, the process recipe setting is illustrated in the paper.

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Periodical:

Advanced Materials Research (Volume 699)

Pages:

92-95

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.699.92

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Online since:

May 2013

Authors:

Zhen Yu Li, Hong Sheng Li

Keywords:

Artificial Neural Network (ANN), Deposition Rate, Feed-Forward Network, Plasma Chemical Vapor Deposition, Recipe

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References

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