Oxidition Resistance of Multi-Arc Ion Plating TiN Films

Jie Wang; Shi Hang Jiang; Juan Juan Wang

doi:10.4028/www.scientific.net/AMR.706-708.180

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Oxidition Resistance of Multi-Arc Ion Plating TiN Films
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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 706-708Oxidition Resistance of Multi-Arc Ion Plating TiN...

Oxidition Resistance of Multi-Arc Ion Plating TiN Films

Abstract:

Depositing TiN Film on the surface of 4Cr5MoSiV1 with multi-arc ion plating technology method. And 350°C, 450°C, 550°C and 650 °C short oxidation test and 550 °C cyclic oxidation test. By scanning electron microscopy (SEM) and electron spectrometry (EDS) to analysis micro-structure and phase structure of test samples, study TiN film on oxidation resistance, and utilize indentation method to measure mechanical properties. Results show: In a short time under oxidizing conditions, at 550 °C the TiN film still has a good oxidation resistance. The film still have a sufficient bonding strength below 600 °C.

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Periodical:

Advanced Materials Research (Volumes 706-708)

Pages:

180-183

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.706-708.180

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Online since:

June 2013

Authors:

Jie Wang, Shi Hang Jiang, Juan Juan Wang

Keywords:

Adhesion Strength, Oxidation Resistance, TiN Film

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