Fabrication and Calibration of a Thin Film Heat Flux Sensor

Jia Xing Liu; Hang Guo; Jun Ying Jiang; Fang Ye; Chong Fang Ma

doi:10.4028/www.scientific.net/AMR.718-720.1181

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 718-720Fabrication and Calibration of a Thin Film Heat...

Fabrication and Calibration of a Thin Film Heat Flux Sensor

Abstract:

In order to measure heat flux in micro scale space, a thin film heat flux sensor is designed, fabricated and calibrated. Vacuum coating technology is applied to fabricate the sensor with a total thickness of 0.49μm. Silicon dioxide wafer is used as substrate. Cobalt and stibium is deposited on the substrate to form thermopile. Correlation coefficient R is 0.94025. Sensitivity of the heat flux sensor is 0.05062 μV/(W/m²). Time constant of the sensor is 0.66044 seconds. Dynamic test shows that the heat flux sensor responds rapidly to periodic heat flux which is supplied by halogen lamp.

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Periodical:

Advanced Materials Research (Volumes 718-720)

Pages:

1181-1184

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.718-720.1181

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Online since:

July 2013

Authors:

Jia Xing Liu, Hang Guo, Jun Ying Jiang, Fang Ye, Chong Fang Ma

Keywords:

Cobalt, Heat Flux, Mirco Sensor, Stibium, Thin Film, Transient

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