Study on Measurement of Thin Film Thickness with Lateral Shearing Interferometry

Jun Hong Su; Ying Shi; Jin Man Ge

doi:10.4028/www.scientific.net/AMR.718-720.848

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 718-720Study on Measurement of Thin Film Thickness with...

Study on Measurement of Thin Film Thickness with Lateral Shearing Interferometry

Abstract:

The film thickness is an important technical indicator of film devices, and its accuracy directly affects various performances of optical components. In fabrication process of film device, fast and accurate measurement of film thickness has positive significance on product quality control. In this paper, measure film thickness with lateral shearing interferometry. Collect interferograms through structured lateral shearing interference platform, process interferogram with Fast Fourier Transform method to extract phase, unwrap the wrapped phase to achieve phase value. Finally, calculate film thickness based on lateral shearing interference principle. The thickness of sample is 119.6800nm measured by this method, basically the same with the result 120.6036nm that measured by ZYGO interferometer. This experiment shows that lateral shearing interferometry not only suit to measurement of film thickness, but also abundant high-precision method of measuring film thickness, and has high practical value.

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Periodical:

Advanced Materials Research (Volumes 718-720)

Pages:

848-852

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.718-720.848

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Online since:

July 2013

Authors:

Jun Hong Su, Ying Shi, Jin Man Ge

Keywords:

Film Thickness, Interferogram Processing, Lateral Shearing Interferometry, Phase Unwrapping

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References

[1] Liu Jian, Wang Xiao-ming. Research on wave front character and reconstruction based on lateral shearing interference [D]. Dalian, Dalian University of Technology, 2008.

Google Scholar

[2] Xu Jing. Waterfront reconstruction method and simulation study of shearing interferometry to measure optical components [D].Harbin, Harbin Institute of Technology, 2010.

Google Scholar

[3] Shu Li-Bang, He Yong. Study on redial shearing interferometery testing techniques [D]. Nanjing, Nanjing University of Science and Technology, 2012.

Google Scholar

[4] Liu Xiao-jun, Gao Yong-sheng. Accurate phase recovery algorithm in lateral shearing interferometry[J]. Optics and Precision Engineering, 2004,12 (5).

Google Scholar

[5] Bai Jia-Guang, Wang Zhong-Hou. Study on design method of sagnac Lateral shearing interferometer [J]. Spacecraft Engineering, 2010, 19 (2):87-91.

Google Scholar