Evaluation of GMR Head Durability against Nanoscale Scratches Using High-Field Transfer Curves

Abstract:

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We investigated the durability of giant magnetoresistive (GMR) heads to nanoscale scratches created during the lapping process. Analysis using high-field transfer curves after deliberate scratching with an atomic force microscope (AFM) identified changes in the magnetization of the head and a reduction in pinning strength, which is a magnetic performance indicator. Additionally, finite element method (FEM) analysis suggested that the overall effects on the GMR head following nanoscale scratching increased with scratch depth.

Info:

Periodical:

Advanced Materials Research (Volumes 76-78)

Edited by:

Han Huang, Liangchi Zhang, Jun Wang, Zhengyi Jiang, Libo Zhou, Xipeng Xu and Tsunemoto Kuriyagawa

Pages:

520-525

DOI:

10.4028/www.scientific.net/AMR.76-78.520

Citation:

H. Tanaka et al., "Evaluation of GMR Head Durability against Nanoscale Scratches Using High-Field Transfer Curves ", Advanced Materials Research, Vols. 76-78, pp. 520-525, 2009

Online since:

June 2009

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Price:

$35.00

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