Structures and Properties of BiFeO₃ Thin Films on Pt(111)/Ti/SiO₂/Si Substrates Prepared by Pulsed-Laser Deposition under Various Oxygen Partial Pressures

Abstract:

Ferroelectric BiFeO₃ (BFO) thin films were prepared on Pt (111)/Ti/SiO₂/Si substrates by pulsed-laser deposition under various oxygen partial pressures (P_O2). The effects of P_O2 on the phase, orientation, surface morphology, and ferroelectric properties of the films were investigated, particularly in regard to relationships between structure and properties. It was found that the crystallographic orientation and surface morphology of the BFO thin films strongly depended on P_O2. Films prepared at P_O2=10 Pa had a high degree of (111) orientation and densely packed grains. A maximum of twice the remanent polarization for the BFO thin film was 68 μC/cm².

• Periodical: Advanced Materials Research (Volumes 760-762)
• Pages: 714-718
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.760-762.714
• Online since: September 2013
• Authors: Mei Lin Yi, Chuan Bin Wang, Qiang Shen, Lian Meng Zhang
• Keywords: BiFeO₃ Thin Films, Oxygen Partial Pressure, Pt(111)/Ti/SiO₂/Si Substrates, Pulsed-Laser Deposition

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