Role of Sputtering Power on the Structural and Optical Properties of ZnO/SiO2 Films Deposited by Radio Frequency Magnetron Sputtering

Shuang Li; Ming Chen; Feng Xiang Wang

doi:10.4028/www.scientific.net/AMR.760-762.776

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 760-762Role of Sputtering Power on the Structural and...

Role of Sputtering Power on the Structural and Optical Properties of ZnO/SiO₂ Films Deposited by Radio Frequency Magnetron Sputtering

Abstract:

In the present work, we investigated the effect of sputtering power on the structural and optical properties of ZnO films by radio frequency (rf) magnetron sputtering. Atom force microscopy (AFM), X-ray diffraction (XRD) and Prism coupling method were adopted to investigate the structure and optical properties of ZnO thin films deposited by sputtering powers in the range from 100~150W. XRD and AFM results shown that ZnO films with high c-axis preferred orientation crystalline structures have been successfully deposited under higher sputtering power condition. Moreover, it was also found that the indexes refractive of the films obtained by higher sputtering power are less than that of the bulk ZnO materials, which is closer to Crystal Refractive index.

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Periodical:

Advanced Materials Research (Volumes 760-762)

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776-779

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.760-762.776

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Online since:

September 2013

Authors:

Shuang Li, Ming Chen, Feng Xiang Wang

Keywords:

C-Axis Orientation, Waveguide, X-Ray Diffraction (XRD), ZnO Films

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