Characterization of ZrN Thin Films Deposited by Reactive DC Magnetron Sputtering

Abstract:

In the past decade, many transition metal nitride thin films, especially titanium nitride (TiN) and zirconium nitride (ZrN), have been widely used as hard coatings, decorative coatings, diffusion barriers in IC technology and heat mirrors, as a result of their attractive properties of high hardness, corrosion resistance, thermal stability and electrical resistivity [1-4]. However, the ZrN films have shown significant performance regarding to its higher hardness, better corrosion resistance, lower electrical resistivity and warmer golden colour compared to those of the TiN films. ZrN films have shown significant performance advantages over TiN films [5-.

• Periodical: Advanced Materials Research (Volume 770)
• Pages: 350-353
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.770.350
• Online since: September 2013
• Authors: Attapol Choeysuppaket, Nirun Witit-Anun, Surasing Chaiyakun
• Keywords: Nitrogen Gas Flow Gas, Reactive DC Magnetron Sputtering, ZrN Thin Films

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