Study on Preparation of Polishing Powder for LCD

Xi Long Wang; Shou Zhi Yi; En Wu Liang; Yuan Yuan Wu; Zhong Xin Fang

doi:10.4028/www.scientific.net/AMR.785-786.480

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Study on Preparation of Polishing Powder for LCD
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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 785-786Study on Preparation of Polishing Powder for LCD

Study on Preparation of Polishing Powder for LCD

Abstract:

Polishing powder based on CeO₂ is synthesized by a neutral precipitation method under the action of an additive, with Ce₂(CO₃)₃ as starting material and NH₄HCO₃ as the precipitant. The size distribution of CeO₂ particles is narrow-ranged and their morphology show a shape of polyhedral globules. They have a satisfied dispersion in water. The optimum characteristics are obtained under the conditions of followings: the mass ratio of F (in H₂SiF₆ ) to CeO₂ 7%, the molar concentration of additive A4 0.85mol/L, calcined at 850°C for 2 hours.