SrTiO3 Thin Films Deposition Using Pulsed Laser Deposition Technique

Pia Dinari; Christian Chandra; Joko Suwardy; Salim Mustofa; Yudi Darma

doi:10.4028/www.scientific.net/AMR.789.72

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 789SrTiO3 Thin Films Deposition Using Pulsed Laser...

SrTiO₃ Thin Films Deposition Using Pulsed Laser Deposition Technique

Abstract:

Strontium titanate (SrTiO₃) thin film has been deposited on Si (100) substrate using pulsed laser deposition technique. Film deposition was carried out at low temperature (150°C) by maintained the pressure at 10^-4 Torr. Nanometer-thick SrTiO₃ film on Si substrate was characterized using SEM, AFM, XRD, and Raman Spectroscopy. SEM and AFM images show that SrTiO₃ film has growth on Si substrate uniformly. Raman and XRD spectroscopy also support the growth of SrTiO₃ film on Si substrate. Furthermore, to investigate the effect of post-deposition thermal annealing, the samples were annealed up to 900°C. Thermal stability of SrTiO₃/Si structure was studied by mean XRD spectra. The X-Ray Diffraction pattern indicates the crystallinity improvement through atomic arrangements during thermal annealing process.

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Advanced Materials Research (Volume 789)

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72-75

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.789.72

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Online since:

September 2013

Authors:

Pia Dinari, Christian Chandra, Joko Suwardy, Salim Mustofa, Yudi Darma

Keywords:

Annealing, Pulsed Laser Deposition, SrTiO₃ Thin Films, Structure Properties, Thermal Stability

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