Effect of the Amorphous Silica Coating Derived by Sol-Gel Processing on the Oxidation Behavior of Ni

B.Y. Ren; Y.H. Gao; S.J. Wang; X.J. Zhang; N.X. Feng

doi:10.4028/www.scientific.net/AMR.79-82.671

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 79-82Effect of the Amorphous Silica Coating Derived by...

Effect of the Amorphous Silica Coating Derived by Sol-Gel Processing on the Oxidation Behavior of Ni

Abstract:

Amorphous silica coating was deposited on the surface of Ni by dip-coating processing from commercial silica sol. Isothermal oxidation of the coated and uncoated specimens at 973 K to 1173 K in air was conducted to investigate the effect of the silica coating on the oxidation behavior of Ni by TGA, SEM and XRD. Results of the oxidation tests showed that the oxidation rate of Ni was reduced greatly due to the applied thin film. The possible mechanism of the effect of thin film on the oxidation of Ni was discussed.

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Advanced Materials Research (Volumes 79-82)

Pages:

671-674

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.79-82.671

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Online since:

August 2009

Authors:

B.Y. Ren, Y.H. Gao, S.J. Wang, X.J. Zhang, N.X. Feng

Keywords:

High Temperature Oxidation, Ni, SiO₂ Thin Film, Sol-Gel Process

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