The Influence of Substrate Temperature on the Morphological and Optical Properties of ZnTiO3 Thin Films Prepared by Magnetron Sputtering

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Cubic ZnTiO3 thin films have been prepared by radio frequency magnetron sputtering on n-type (100) Si substrate at different temperatures. The morphological and optical properties of ZnTiO3 films in relation to substrate temperatures are investigated by spectroscopic ellipsometry (SE) and AFM as well as SEM in detail. X-ray diffraction (XRD) measurement shows that all the films have a cubic phase structure and the optimum substrate temperature to form crystalline ZnTiO3 thin film is 250 °C. Through SEM and AFM, the particle size in thin films and film surface roughness increase with increasing the substrate temperature. Based on a parameterized TaucLorentz dispersion model, the optical constants and surface roughness of ZnTiO3 films related to the substrate temperature are systematically extracted by SE measurement. The surface roughness of the film measured from AFM agrees well with result extracted from SE, which proved that the established SE model is reasonable. With increasing substrate temperature, the refractive index decreases and the main factor in determining the refractive index was deduced to be the surface roughness related to the film packing density. The extinction coefficient of the samples is close to zero, but increases slightly with the increase of the substrate temperature, which is due to the enhancement of scattering effect in the crystalline ZnTiO3 film.

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September 2013

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[1] D. H. Im, C. J. Jeon, E. S. Kim, Ceram. Int. 38 (2012) S191-S195.

Google Scholar

[2] T. Leist, J. Chen, W. Jo, E. Aulbach, J. Suffner, J. Rödel, J. Am. Ceram. Soc. 95 (2012) 711-715.

DOI: 10.1111/j.1551-2916.2011.04848.x

Google Scholar

[3] I. Popescu, I. Sandulescu, A. Redey, I-C. Marcu, Catal. Lett. 141 (2011) 445-451.

Google Scholar

[4] M. H. Habibi, M. Mikhak, M. Zendehdel, M. Habibi, Int. J. Electrochem. Sci., 7 (2012) 6787-6798.

Google Scholar

[5] Y. C. Lee, Y. L. Huang, W. H. Lee, F. S. Shieu, Thin Solid Film 518 (2010) 7366-7371.

Google Scholar

[6] S. P. Wu, J. H. Luo, S. X. Cao, J. Alloys Compd. 502 (2010) 147-152.

Google Scholar

[7] M. Wishwas, K. N. Rao, A. R. Phani, K. V. A. Gowda, J. Opt. 41(1) (2012) 60-64.

Google Scholar

[8] Y. W.

Google Scholar

[8] Wang, P. H. Yuan, C. M. Fan, Y. Wang, G. Y. Ding, Y. F. Wang, Ceram. Int. 38 (2012) 4173-4180.

Google Scholar

[9] A. R. Phani, M. Passacantando, S. Santucci, J. Phys. Chem. Solids 68 (2007) 317-323.

Google Scholar

[10] S. F. Wang, F. Gu, M. K. Lu, W. G. Zou, S. W. Liu, D. Xu, D. R. Yuan, G. J. Zhou, J. Phys. Chem. Solids 65 (2004) 1243-1245.

Google Scholar

[11] D. Poitras, S. Larouche, L. Martinu, Appl. Opt. 41 (2002) 5249-5255.

Google Scholar

[12] M. F. Schubert, J. Q. Xi, J. K. Kim, E. F. Schubert, Appl. Phys. Lett. 90 (2007) 141115.

Google Scholar

[13] C. Ye, X. M. Teng, S. S. Pan, H. T. Fan, G. H. Li, Appl. Phys. A: Mater. Sci. Process. 90 (2008) 375-378.

Google Scholar

[14] F. H. Dulin, D. E. Rase, J. Am. Ceram. Soc. 43 (1960) 125-131.

Google Scholar

[15] S .F. Bartram, R. A. Slepetys, J. Am. Ceram. Soc. 44 (1961) 493-499.

Google Scholar

[16] Y. F- G. Biglu, E. T. -Nassaj, Ceram. Int. 39 (2013) 2511-2518.

Google Scholar

[17] G. E. Jellison Jr., F.A. Modine, P. Doshi, A. Rohatgi, Thin Solid Film 313-314 (1998) 193-197.

DOI: 10.1016/s0040-6090(97)00816-x

Google Scholar

[18] D. A. G. Bruggeman, Ann. Phys. 24 (1935) 636-679.

Google Scholar

[19] L. Q. Zhu, Q. Fang, G. He, M. Liu, L. D. Zhang, Nanotech. 16 (2005) 2865-2869.

Google Scholar

[20] G. He, L.Q. Zhu, M. Liu, Q. Fang, L. D. Zhang, Appl. Surf. Sci. 253 (2007) 3413–3418.

Google Scholar