Micro Parts Errors to Precision Manufacturing using UV-LIGA Technology

Abstract:

To remove the shortcomings from the manufacturing process it is necessary to optimize all process parameters, for all stages of technological process: the exposure, the development, the electroforming and removal of the exposed SU8. This research implies that various types of MEMS devices can be developed at a high accuracy with design flexibility, only if all process parameters are optimized. This article is presenting a study regarding typical errors arisen during manufacturing of micro-parts using UV-LIGA technology.

• Periodical: Advanced Materials Research (Volumes 816-817)
• Pages: 237-241
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.816-817.237
• Online since: September 2013
• Authors: Cristinel Ilie, C. Daniel Comeagă, Octavian G. Donţu, Marius Popa
• Keywords: Direct Writing Lithography, Fabrication Errors, Micro Machining, Microfabrication Technologies, SU8, UV-LIGA

References

[1] C. K. Malek, V. Saile, Applications of LIGA technology to precision manufacturing of high-aspect-ratio micro-components and system, Microelectronics Journal 35 (2004) 131–143.

DOI: 10.1016/j.mejo.2003.10.003

[2] J. S. Lee, S. S. Lee, Fabrication of a freestanding micro mechanical structure using electroplated thick metal with a HAR SU-8 mold, Microsyst Technol. 15 (2009) 287–296.

DOI: 10.1007/s00542-008-0709-x

[3] F. Zhang , X. He, Z. Shi, W. Zhou, Structure design and fabrication of silicon resonant micro-accelerometer based on electrostatic rigidity, Proceedings of WCE 2009, London, 1(2009).

[4] J. Schulz, Study concerning metal microstructure processing using LIGA technology, Karlsruhe, Germany, 2008, unpublished.

[5] DWL 66FS Reference Manual, Heidelberg Instruments, (2007).

[6] NANO SU8 – Negative Tone Photoresist, MicroChem, (2002).

[7] J. Mathuni, Fast and reliable removal of SU8 resist, R3T Company, Technical Review, (2009).

[8] C. Ilie, M. Popa, P. Prioteasa, I. Chirita, and N. Tanase, Applications of LIGA technology for the development of Micromechanical Systems, Scientific Buletin of University Politehnica of Bucharest, (2011) 137-150.

[9] C. Koch, T. J. Rinke, Lithography–Theory and Application of Photoresists, Developers, Solvent and Etchants, 2008, MicroChemicals.

[10] A. Saghiri, M. Kaden et al., SU8 multiple layer structuring by means of maskless photolithography, Proc. SPIE 6110, 611003 (2006).

[11] C. Kollia, N. Spyrellis, J. Amblard, M. Froment, G. Maurin , J. Appl. Electrochem. 20 (1990).

[12] V. Vasilache, Studies of hardness for the Electrodepozited Nickel from Watts Baths with addition of Polyvinyl Pyrrolidone (PVP), Romanian Journal of Chemistry, (2009).