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Influence of Thickness on the Structural, Electrical and Optical Properties of Al-Doped ZnO Films Deposited by RF Magnetron Sputtering

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Abstract:

Transparent conducting aluminum-doped zinc oxide (AZO) films with different film thickness had been prepared on soda-lime glass substrates by radio frequency magnetron sputtering using a high density ceramic target. The structural, morphology, electrical, and optical properties of the AZO thin films were investigated by X-ray diffraction, scanning electron microscope, Hall-effect measurement and optical transmission spectroscopy, which were strongly influenced by film thickness. With the film thickness increasing from 140 nm to 710 nm, the resistivity decreases from 9.78 × 103 to 3.23 × 103 Ω.cm and an average optical transmission decreases from 88% to 80% in the visible range and the optical bandgap decreases from 3.47 to 3.24 eV.

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Periodical:

Advanced Materials Research (Volumes 821-822)

Pages:

845-848

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.821-822.845

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Online since:

September 2013

Authors:

Jian Chen, Yi Hua Sun, Xiao Hua Sun, Cai Hua Huang

Keywords:

Al-Doped ZnO, Film Thickness, Magnetron Sputtering, Transparent Conducting Oxide

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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