Analysis of Threshold Voltage Variance in 45nm N-Channel Device Using L₂₇ Orthogonal Array Method

Abstract:

In this research, orthogonal array of L27 in Taguchi Method was used to optimize the process parameters (control factors) variation in 45nm n-channel device with considering the interaction effect. The signal-to-noise (S/N) ratio and analysis of variance (ANOVA) are employed to study the performance characteristics of the device. There are only five process parameters (control factors) were varied for 3 levels to performed 27 experiments. Whereas, the two noise factors were varied for 2 levels to get four readings of Vth for every row of experiment. In this study, nominal-the-best characteristic was used in an effort to minimize the variance of Vth. The results show that the Vth values have least variance and percent different from the target value (0.287V) for this device is 1.42% (0.293V). This value is closer with International Technology Roadmap for Semiconductor (ITRS) prediction.

• Periodical: Advanced Materials Research (Volume 903)
• Pages: 297-302
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.903.297
• Online since: February 2014
• Authors: Fauziyah Salehuddin*, Anis Suhaila Mohd Zain, Niza Mohd Idris, Ahmad Kamal Mat Yamin, Afifah Maheran Abdul Hamid, Ibrahim Ahmad, P. Susthitha Menon
• Keywords: ANOVA, NMOS Device, PMOS Device, S/N Ratio, Taguchi Method, Threshold Voltage

References

[1] Ramakrishnan, H., S. Shedabale, G. Russell, and A. Yakovlev, Analysing the effect of process variation to reduce parametric yield loss, IEEE ICICDT (2008) 171–175.

DOI: 10.1109/icicdt.2008.4567272

[2] M. S. Phadke, Quality Engineering Using Robust Design. Pearson Education, Inc. and Dorling Kindersley Publishing, Inc., (1998).

[3] Atil, Hulya and Unver, Yakut, A Different Approach of Experimental Design: Taguchi Method, Pakistan J. Biological Sciences, 3(9): (2000) 1538-1540.

[4] Ismail A.R., et. al, The Optimization of Environmental Factors at manual Assembly Workstation by Using Taguchi Method, J. Applied Sciences, 10(13): (2010) 1293-1299.

DOI: 10.3923/jas.2010.1293.1299

[5] Arenas, D. Nava, et. al., Optimization of Germination Conditions of Blue Corn by Taguchi Orthogonal Array Methodology, Asian J. Plant Sciences, 7(7): (2008) 682-686.

DOI: 10.3923/ajps.2008.682.686

[6] Lan, Tian-Syung, et. al, An Approach to Rib design of Injection Molded Product Using Finite Element and Taguchi Method, J. Applied Sciences, 7(2): (2008) 299-305.

DOI: 10.3923/itj.2008.299.305

[7] Salehuddin, F., I. Ahmad, F.A. Hamid and A. Zaharim, Optimization of Process Parameter Variability in 45 nm PMOS Device using Taguchi Method, J. Applied Sciences, 11(7): (2011) 1261-1266.

DOI: 10.3923/jas.2011.1261.1266

[8] Salehuddin, F., Ahmad, I., Hamid, F.A., Zaharim, A., Elgomati, H.A., Majlis, B.Y., Analyze of input process parameter variation on threshold voltage in 45nm n-channel MOSFET, 2011 IEEE Regional Symposium on Micro and Nano Electronics, (2011).

DOI: 10.1109/rsm.2011.6088294

[9] ITRS 2011 Report; http: /www. itrs. net.

[10] N. Naidu, Mathematical model for quality cost optimization, robotics and computer integrated manufacturing, International Conference on Flexible Automation and Intelligent Manufacturing, vol. 24(6), (2008) 811–815.

DOI: 10.1016/j.rcim.2008.03.018