In Situ Observations of Stresses in Al Interconnect Line by Synchrotron Radiation under Thermal/Electrical Conditions

Article Preview

Abstract:

In-situ observation of stress in Al interconnects under electromigration and thermal effect by using the synchrotron radiation x-ray diffraction. The test temperature was controlled by changing the current density of W (self-heating structure). The EM-induced stress was also investigated with current densities from 3x105A/cm2 to 4x106A/cm2.The conclusion agreed well with the simulation results.

You might also be interested in these eBooks

Info:

Periodical:

Pages:

88-91

Citation:

Online since:

April 2014

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2014 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

* - Corresponding Author

[1] Bob Baoping: Introduction to two-dimensional X-ray diffraction(Powder Diffr., Vol. 18(2), 2003, pp.71-85).

Google Scholar

[2] Takao Hanabusa, Kazuya Kusaka and Osami Sakata: Thin Solid Films, Vo1. 459, 2004, pp.245-248.

DOI: 10.1016/j.tsf.2003.12.102

Google Scholar

[3] S. Ganti, H. Ardebiti and A. Alizad.: Inter Society Conference on Thermal Phenomena, 2004, pp.431-438.

Google Scholar