Preparation and Photocatalytic Properties of ZnO Thin Films

Han Shui Wu; Ying Lian Wang

doi:10.4028/www.scientific.net/AMR.951.96

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Study on Photocatalytic Degradation of Phenol by ZnO Thin Films
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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 951Preparation and Photocatalytic Properties of ZnO...

Preparation and Photocatalytic Properties of ZnO Thin Films

Abstract:

Highly photoactive ZnO thin films on glass substrates and quartz substrates have been prepared by sol-gel process. Structural features, surface morphology and UV absorption spectrum have been studied by XRD, SEM and UV-Vis scanning spectrophotometer. The influence of degradation temperatures, original concentration of phenol and air flux on degradation rates have also been studied. And the results show the best conditions, degradation temperature is between 25^oC and 45^oC, air flux is 40ml/min, the lower original concentration, the higher degradation rates. Excellent adhesion as well as recyclable and efficient in phenol degradation of ZnO thin films were found in this experiment.

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Periodical:

Advanced Materials Research (Volume 951)

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96-99

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.951.96

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Online since:

May 2014

Authors:

Han Shui Wu, Ying Lian Wang*

Keywords:

Phenol, Photocatalysis, Sol-Gel, ZnO Thin Films

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