Fabrication and Structure Measurement of the Double-Barrier Nano Film Resonant Tunneling Gyroscope
In this paper, a gyroscope with novel structure is designed and fabricated by the GaAs surface micromaching technology and GaAs bulk micromachining processes technology to achieve an integration of RTD and gyroscope structure. The structure and properties of RTD are tested by Transmission electron microscopy and Aglient 4156C semiconductor analyzer, and then the key parameters of gyroscope are measured by application of Scanning Electron Microscope. The effect of packaged gyroscope is tested by Polytec Micro-system analyzer. The problems in the fabrication process are analyzed and summarized, which have certain reference significance for the further study.
Zhengyi Jiang and Chunliang Zhang
K. Du et al., "Fabrication and Structure Measurement of the Double-Barrier Nano Film Resonant Tunneling Gyroscope ", Advanced Materials Research, Vols. 97-101, pp. 4225-4229, 2010