Relationship of Pressure and Plasma Temperature in Plasma DC Glow Discharge

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Abstract:

The DC glow discharge of nitrogen gas was carried out by 5 kV DC power supply, which was used to bias voltage between two parallel plate electrodes in the cylindrical glass tube chamber. The distance between two parallel plate electrodes was about 37.5 cm. The voltage was applied on these electrodes between 800 V to 1400 V. The nitrogen pressure in the cylindrical glass tube chamber was controlled by rotary pump and vacuum value. Optical Emission Spectroscopy (OES) was used to investigate the local emissivity of nitrogen glow discharge in the range between 200 and 1,100 nm. The spatial distribution of reactive species was measured at different nitrogen pressures from 0.15-1.90 mbar. These measurements were obtained to analyze the electron temperature. The effect of different nitrogen pressures was studied on the electron temperature and the configuration of nitrogen plasma. In the result, it was found that the plasma column increased with increasing the nitrogen pressure. The electron temperature was less than 0.8 eV.

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293-296

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June 2014

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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[1] A.A. Garamoon, A. Samir, F.F. Elakshar, A. Nosair, E.F. Kotp, Spectroscopic study of argon DC glow discharge, IEEE T. Plasma Sci. 35 (2007) 1-6.

DOI: 10.1109/tps.2006.889270

Google Scholar

[2] G.X. Ming, Z.T. dong, Pressure dependence of electron density distribution in glow discharge, Chin. Phys. Soc. 4 (1995) 906-911.

DOI: 10.1088/1004-423x/4/12/004

Google Scholar

[3] B.T. Chiad, T.L.A. Zubaydi, M.K. Khalaf, A.I. Khudiar, Characterization of low pressure plasma-dc glow discharges (Ar, SF6 and SF6/He) for Si etching, Indian J. Pure Ap. Phy. 48 (2010) 723-730.

Google Scholar

[4] V.K. Unnikrishnan, K. Alti, V.B. Kartha, C. Santhosh, G.P. Gupta, B.M. Surl, Measurements of plasma temperature and electron density in laser-induced copper plasma by time-resolved spectroscopy of neutral atom and ion emissions, Pramana J. Phys. 74 (2010).

DOI: 10.1007/s12043-010-0089-5

Google Scholar

[5] S.S. Hamed, Spectroscopic determination of excitation temperature and electron density in premixed laminar flame, Egypt. J. Sol. 28 (2005) 349-357.

DOI: 10.21608/ejs.2005.149334

Google Scholar

[6] NIST Atomic Spectra Database on http: /www. nist. gov.

Google Scholar