Preparation and Properties of TiO2 Thin Films Deposited on Different Substrates by Sol-Gel Method

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In this work, TiO2 thin films were prepared by a sol-gel spin coating method on glass slide, stainless steel 304 and silicon wafer substrates. The thin films were annealed at different temperatures at ambient atmosphere. The effect of substrates and annealing temperatures on microstructure, surface morphology and hydrophilicity of the films were characterized by Raman spectroscopy, atomic force microscopy and water contact angle measurement, respectively. The Raman spectra indicated that the annealed TiO2 thin films (at 550 °C) coated on stainless steel and silicon wafer exhibited anatase structure. The contact angle of all samples decreased with increasing the UV-irradiation time and annealing temperature.

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355-358

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June 2014

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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