Structural and Optical Properties of Anatase-TiO2 Sputtered Nano-Thin Films

Suree Tongwanichniyom; Nirun Witit-Anun

doi:10.4028/www.scientific.net/AMR.979.370

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 979Structural and Optical Properties of Anatase-TiO2...

Structural and Optical Properties of Anatase-TiO₂ Sputtered Nano-Thin Films

Abstract:

Titanium dioxide (TiO₂) nanothin films were deposited on unheated substrate, the glass slide and Si-wafer, by DC reactive magnetron sputtering with different substrate-target distance (d_st), in range of 8 to 14 cm. The structural, surface morphology and transmittance spectrum of TiO₂ thin films were characterized by grazing-incidence X-ray diffraction (GI-XRD), atomic force microscopy (AFM) and spectrophotometer, respectively. XRD results show that as-deposited TiO₂ films with short substrate-target distance have only anatase crystal structure corresponding to the anatase in (101) and (200) plane, and turn to be amorphous with long substrate-target distance. The thickness and roughness varied from 50 nm to 142 nm and 1.6 nm to 3.5 nm, respectively. The as-deposited TiO₂ films exhibited high visible transmittance. The optical constants of the films, refractive index (n) and extinction coefficient (k), were calculated by Swanepoel method, at 550 nm, was about 2.43 - 2.76 and 0.082 - 0.187, respectively. The energy band gap (E_g) of the as-deposited TiO₂ films in the range of 3.20 - 3.25 was observed.

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Periodical:

Advanced Materials Research (Volume 979)

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370-373

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https://doi.org/10.4028/www.scientific.net/AMR.979.370

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Online since:

June 2014

Authors:

Suree Tongwanichniyom*, Nirun Witit-Anun

Keywords:

Anatase, DC Reactive Magnetron Sputtering, Optical Constant, TiO₂ Thin Films

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References

[1] U. Diebold, The Surface Science of Titanium Dioxide, Surface Science Reports. 48 (2003) 53-229.

DOI: 10.1016/s0167-5729(02)00100-0

Google Scholar

[2] X. Fujishima, C.R. Zhang, Titanium dioxide photocatalysis: Present situation and future approaches. Chimie. 9 (2006) 750-760.

DOI: 10.1016/j.crci.2005.02.055

Google Scholar

[3] L.J. Meng, M.P. dos Santos, Investigations of titanium oxide films deposited by d. c. reactive magnetron sputtering in different sputtering pressures, Thin Solid Films. 226 (1993) 22-29.

DOI: 10.1016/0040-6090(93)90200-9

Google Scholar

[4] K. Okimura, Low temperature growth of rutile TiO2 films in modified rf magnetron sputtering, Surface and Coatings Technology. 135 (2001) 286-290.

DOI: 10.1016/s0257-8972(00)00999-3

Google Scholar

[5] R. Swanepoel, Determination of the thickness and optical constants of amorphous silicon, Journal of physics E. 16 (1983) 1214-1222.

DOI: 10.1088/0022-3735/16/12/023

Google Scholar

[6] P.K. Song, Y. Shigesato, M. Kamei, I. Yasui, Electrical and Structural Properties of Tin-Doped Indium Oxide Films Deposited by DC Sputtering at Room Temperature, Japanese Journal of Applied Physics. 38 (1999) 2921-2927.

DOI: 10.1143/jjap.38.2921

Google Scholar

[7] K. Okimura, A. Shibata, N. Maeda, K. Tachibana, Y. Noguchi, K. Tsuchida, Preparation of Rutile TiO2 films by RF magnetron sputtering, Japanese Journal of Applied Physics. 34 (1995) 4950-4955.

DOI: 10.1143/jjap.34.4950

Google Scholar

[8] S.B. Amor, G. Baud, J. P. Besse, M. Jacquet, Elaboration and characterization of titania coatings, Thin Solid Films. 293 (1997) 163-169.

DOI: 10.1016/s0040-6090(96)09106-7

Google Scholar