Stress Characterization and Mechanical Analysis for Supporting Leg of SiGe/Si MQWs Based Bolometer

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Abstract:

The paper presents an “L-type” leg applied in SiGe/Si Multi Quantum Wells (MQWs) based bolometer. Characterization structure has been designed to take measurement for α-SiNx:H film stress. The displacement of beam endpoint in the structure is 0.48 micron and the interior stress is about 87 MPa totally through generalized Hooke law. Furthermore, the mechanical analysis for SiGe/Si MQWs based bolometer has been taken and the largest stress is about 600 MPa in the calculation. The bolometer SEM photograph is shown at last.

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Advanced Materials Research (Volumes 989-994)

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2943-2946

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July 2014

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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[1] A. Rogalski. Infrared detectors: an overview [J]. Infrared Physics & Technology, vol. 43, pp.187-210, (2002).

DOI: 10.1016/s1350-4495(02)00140-8

Google Scholar

[2] T. Dong, Z. Yang, Q. Bi, et al. Freon R141b flow boiling in silicon microchannel heat sinks: experimental investigation [J]. Heat and Mass Transfer, vol. 44, pp.315-324, (2008).

DOI: 10.1007/s00231-007-0236-9

Google Scholar

[3] S. Eminoglu, M. Y. Tanrikulu and T. Akin. A Low-Cost 128×128 Uncooled Infrared Detector Array in CMOS Process [J]. Journal of Microelectromechanical Systems, vol. 17, p.20, (2008).

DOI: 10.1109/jmems.2007.910235

Google Scholar

[4] L. Zhang and T. Dong. A Si/SiGe quantum well based biosensor for direct analysis of exothermic biochemical reaction [J]. Journal of Micromechanics and Microengineering, vol. 23, p.045011, (2013).

DOI: 10.1088/0960-1317/23/4/045011

Google Scholar

[5] M. Kolahdouz, A. A. Farniya, M. Östling, et al. The performance improvement evaluation for SiGe-based IR detectors [J]. Solid-State Electronics, vol. 62, pp.72-76, (2011).

DOI: 10.1016/j.sse.2011.01.010

Google Scholar

[6] Jiang B, Dong T, Su Y, et al. Epitaxial Growth and Characterization of Self-Doping Si1-xGex/Si Multi-Quantum Well Materials [J]. Journal of Microelectromechanical Systems, vol. 23, pp.213-219, (2014).

DOI: 10.1109/jmems.2013.2269612

Google Scholar

[7] Zhong F, Dong T, Yong H, et al. Void-free wafer-level adhesive bonding utilizing modified poly (diallyl phthalate)[J]. Journal of Micromechanics and Microengineering, 2013, 23(12): 125021.

DOI: 10.1088/0960-1317/23/12/125021

Google Scholar

[8] Duerinckx F, Szlufcik J. Defect passivation of industrial multicrystalline solar cells based on PECVD silicon nitride[J]. Solar Energy Materials and Solar Cells, 2002, 72(1): 231-246.

DOI: 10.1016/s0927-0248(01)00170-2

Google Scholar