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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 143-147Effect of Diffusion Barrier and Impurities in...

Effect of Diffusion Barrier and Impurities in Titanium on the Growth Rate of TiAl₃ Layer

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Diffusion in Materials DIMAT 1996

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Periodical:

Defect and Diffusion Forum (Volumes 143-147)

Pages:

591-596

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.143-147.591

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Online since:

January 1997

Authors:

Toshitada Shimozaki, Takahisa Okino, Masayuki Yamane, Y. Wakamatsu, M. Onishi

Keywords:

4N Titanium, 6N Titanium, Binary Alloy, Boundary Diffusion, Reaction-Diffusion, Ti-Al Systems, TiAl₃

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© 1997 Trans Tech Publications Ltd. All Rights Reserved

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