Exploring Thin-Film Reactions by Means of Simultaneous X-Ray Surface Roughness and Resistance Measurements

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Periodical:

Defect and Diffusion Forum (Volumes 194-199)

Edited by:

Y. Limoge and J.L. Bocquet

Pages:

1477-1490

DOI:

10.4028/www.scientific.net/DDF.194-199.1477

Citation:

C. Lavoie et al., "Exploring Thin-Film Reactions by Means of Simultaneous X-Ray Surface Roughness and Resistance Measurements", Defect and Diffusion Forum, Vols. 194-199, pp. 1477-1490, 2001

Online since:

April 2001

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Price:

$35.00

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