A New Approach to Understanding Electromigration in Al(Cu) Alloys on an Atomistic Basis

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Periodical:

Defect and Diffusion Forum (Volumes 194-199)

Edited by:

Y. Limoge and J.L. Bocquet

Pages:

151-156

DOI:

10.4028/www.scientific.net/DDF.194-199.151

Citation:

C. Schmidt et al., "A New Approach to Understanding Electromigration in Al(Cu) Alloys on an Atomistic Basis", Defect and Diffusion Forum, Vols. 194-199, pp. 151-156, 2001

Online since:

April 2001

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$35.00

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