The Influence of Deposition Conditions upon the Development of Solid-State Reactions in the Ta-Si Thin Film Systemi

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Periodical:

Defect and Diffusion Forum (Volumes 194-199)

Edited by:

Y. Limoge and J.L. Bocquet

Pages:

1643-1648

DOI:

10.4028/www.scientific.net/DDF.194-199.1643

Citation:

Y.N. Makogon et al., "The Influence of Deposition Conditions upon the Development of Solid-State Reactions in the Ta-Si Thin Film Systemi", Defect and Diffusion Forum, Vols. 194-199, pp. 1643-1648, 2001

Online since:

April 2001

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$35.00

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