Reactive Diffusion in the GaSb-Co System at 500°C
p.1619
p.1619
Initial Stage of Reactive Diffusion: Nucleation and Avrami Kinetics
p.1625
p.1625
On Reactive Diffusion: 1) Kinetics, Growth and Diffusion, 2) Equilibrium?
p.1631
p.1631
The Detection of Structural Conversions in Crystallizing Thin Films of the Ta-Si System by the Method of Coherent Optical Fourier-Analysis
p.1637
p.1637
The Influence of Deposition Conditions upon the Development of Solid-State Reactions in the Ta-Si Thin Film Systemi
p.1643
p.1643
Surface and Interface Reactions and Diffusion during the High-Temperature Corrosion of Metals and Alloys
p.1649
p.1649
A Diffusion-Based Model for Uniform Corrosion
p.1661
p.1661
Diffusion and High-Temperature Oxidation of Nickel
p.1675
p.1675
The Role of Oxide Grain Boundary Character Distribution in Nickel Oxidation Kinetics
p.1683
p.1683
The Influence of Deposition Conditions upon the Development of Solid-State Reactions in the Ta-Si Thin Film Systemi
Abstract:
You might also be interested in these eBooks
Info:
Periodical:
Defect and Diffusion Forum (Volumes 194-199)
Pages:
1643-1648
Citation:
Online since:
April 2001
Authors:
Keywords:
Price:
Сopyright:
© 2001 Trans Tech Publications Ltd. All Rights Reserved
Share:
Citation: