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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 194-199Vacancy Model for Threshold Electromigration in...

Vacancy Model for Threshold Electromigration in Thin Metallic Films

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Diffusion in Materials DIMAT2000

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Periodical:

Defect and Diffusion Forum (Volumes 194-199)

Pages:

55-60

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.194-199.55

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Online since:

April 2001

Authors:

A.N. Aleshin, Lasar S. Shvindlerman

Keywords:

Diffusion, Drift Velocity, Electron Wind, Flux, Grain Boundary, Sink, Source, Thin Film, Threshold Electromigration, Vacancy

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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