Vacancy Model for Threshold Electromigration in Thin Metallic Films

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Periodical:

Defect and Diffusion Forum (Volumes 194-199)

Edited by:

Y. Limoge and J.L. Bocquet

Pages:

55-60

DOI:

10.4028/www.scientific.net/DDF.194-199.55

Citation:

A.N. Aleshin and L. S. Shvindlerman, "Vacancy Model for Threshold Electromigration in Thin Metallic Films", Defect and Diffusion Forum, Vols. 194-199, pp. 55-60, 2001

Online since:

April 2001

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$35.00

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