Interstitial Cluster Motion in Nickel: A Molecular Dynamics Study

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Periodical:

Defect and Diffusion Forum (Volumes 194-199)

Edited by:

Y. Limoge and J.L. Bocquet

Pages:

43-48

DOI:

10.4028/www.scientific.net/DDF.194-199.43

Citation:

N.V. Doan et al., "Interstitial Cluster Motion in Nickel: A Molecular Dynamics Study", Defect and Diffusion Forum, Vols. 194-199, pp. 43-48, 2001

Online since:

April 2001

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$35.00

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