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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 194-199Interstitial Cluster Motion in Nickel: A Molecular...

Interstitial Cluster Motion in Nickel: A Molecular Dynamics Study

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Diffusion in Materials DIMAT2000

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Periodical:

Defect and Diffusion Forum (Volumes 194-199)

Pages:

43-48

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.194-199.43

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Online since:

April 2001

Authors:

N.V. Doan, D. Rodney, G. Martin

Keywords:

Diffusion Coefficient, Glide, Interstitial Cluster Migration, Molecular Dynamic (MD)

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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