Investigation of the Diffusion Behavior near Grain Boundaries for Control of the Electrical Features of Semiconducting Oxides

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Periodical:

Defect and Diffusion Forum (Volumes 226-228)

Edited by:

Dr. D.J. Fisher

Pages:

191-196

DOI:

10.4028/www.scientific.net/DDF.226-228.191

Citation:

M. B. Park and N. H. Cho, "Investigation of the Diffusion Behavior near Grain Boundaries for Control of the Electrical Features of Semiconducting Oxides", Defect and Diffusion Forum, Vols. 226-228, pp. 191-196, 2004

Online since:

May 2004

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$35.00

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