Electromigration in Stressed Metal Thin Films

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Periodical:

Defect and Diffusion Forum (Volumes 95-98)

Edited by:

M. Koiwa, K. Hirano, H. Nakajima and T. Okada

Pages:

257-262

Citation:

K.N. Tu and D. Gupta, "Electromigration in Stressed Metal Thin Films", Defect and Diffusion Forum, Vols. 95-98, pp. 257-262, 1993

Online since:

January 1993

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$38.00

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